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glow discharge

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glow discharge 輝光放電。

輝光放電。 “glow“ 中文翻譯：   vi. 1.灼熱；發白熱光；燃燒 〔cf. blaze〕 ...“discharge“ 中文翻譯：   vt. 1.發射(炮等)，打(槍)，射(箭)。 2.起， ...“discharge glow“ 中文翻譯：   放電輝光“abnormal glow discharge“ 中文翻譯：   反常輝光放電; 異常輝光放電“contact glow discharge electrolysis“ 中文翻譯：   接觸性輝光放電電解作用“electric glow discharge method“ 中文翻譯：   發光放電法; 輝光放電法“glow discharge anemometer“ 中文翻譯：   輝光放電風速計“glow discharge boriding“ 中文翻譯：   輝光放電滲硼“glow discharge carbonitriding“ 中文翻譯：   輝光放電碳氮化“glow discharge characteristic“ 中文翻譯：   輝光放電特性“glow discharge current“ 中文翻譯：   輝光放電電流“glow discharge decomposition“ 中文翻譯：   輝光放電分解“glow discharge deposition“ 中文翻譯：   輝光放電沉積“glow discharge detector“ 中文翻譯：   輝光放電檢測器; 輝光放電探測器“glow discharge display panel“ 中文翻譯：   輝光放電顯示板“glow discharge indicator“ 中文翻譯：   輝光放電指示器“glow discharge lamp“ 中文翻譯：   輝光放電燈; 輝光放電管“glow discharge loss“ 中文翻譯：   輝光放電損耗“glow discharge lubricant“ 中文翻譯：   輝光放電合成潤滑劑; 輝光放電所得潤滑劑“glow discharge manometer“ 中文翻譯：   輝光放電壓力計“glow discharge microphone“ 中文翻譯：   輝光放電傳聲器“glow discharge nitriding“ 中文翻譯：   輝光放電氮化; 離子氮化“glow discharge plasma“ 中文翻譯：   輝光放電等離子體“glow discharge process“ 中文翻譯：   輝光放電法“glow discharge rectifier“ 中文翻譯：   輝光放電整流器

glow lamp

Dlc and a - sic : h films were prepared by the rf glow discharge and the reactive sputtering method respectively . there were two reasons that we chose y rays , ultraviolet ( uv ) photons , and neutrons as radiation sources . one is that y rays , uv photons and neutrons irradiation are serious at outer space and / or nucleus irradiation enviromentthe other is that the study on y rays irradiation on the films is a new and an important directioaotherwisejirnited reports have been made of the investigation on the uv photonsjieutrons irradiation influences on these films 本文分別采用射頻( 13 . 56mhz )等離子體cvd及射頻反應濺射方法制得了dlc及a - sic ： h薄膜。文中主要選擇y射線、紫外光及中子作為輻照源有兩方面的原因：一方面，在外層空間， y射線及紫外光輻射十分嚴重，而在核輻射環境下y射線及中子輻射也不可忽視；另一方面， y射線輻照這兩種薄膜完全是一項開創性的工作，同時國內外對紫外光子、中子與這兩種薄膜作用的研究也很少。

No matter how different the discharge scheme is , low pressure discharge plasmas take a common characteristic of bright glow and is generally entitled as low temperature glow discharge . glow discharge plasma has been selected as a most suitable system for plasma diagnostics in laboratory and for application technology development because of its good stability and reproducibility 利用n _ 2輝光放電中n _ 2 ~ +的發射光譜研究了放電空間的溫度分布的變化規律，發現了直流放電的一些重要特性，如阻礙輝光與正常輝光的光譜差別。

Firstly , the paper discusses the characters , principles of excimer laser , and study on pulse discharge process . secondly , for the purpose of designing excimer laser , i spent a lot of time to researsh and finish electrode designing , reducing circuit inductance , spark gap designing , ns discharge , uv preionization , glow discharge 本論文首先對準分子激光特點，原理，脈沖放電進行了評述，其次，以試制xecl準分子激光器為目的，探索并完成了電極設計、回路電感減小方法、火花開關設計、 ns陡前沿放電、紫外預電離、輝光放電、脈沖功率技術研究。

Based on the theory of glow discharge , the angle distribution of electron and the recombination process are simulated by adopting monte carlo method . the doping process of n - type diamond film is investigated by this method for the first time . the results indicate : 1 ) the scattering angle of electrons near the substrate is mainly lange - angle , which is helpful to grow diamond film over a large area when glow discharge is kept ; 2 ) after considering the recombination process , the number of particles distribution is provided 主要結果如下： ( 1 )研究了電子在雪崩碰撞和分解電離后的角分布情況，結果表明基片附近電子的散射以大角散射為主，在維持輝光放電的條件下，較高的偏壓和工作氣壓對金剛石的橫向連續成膜是有益的； ( 2 )考慮了低溫合成金剛石薄膜過程中電子與各種碎片粒子的復合過程，給出了不同的復合系數情況下的粒子數分布，結果顯示各種碎片粒子的分布隨復合系數的變化會出現粒子數分布的漲落現象。

So we applied low temperature techniques to manufacture the sense film of qcm sensors . at low temperature and low pressure , with n - butylamine as the carbon source material , and with dry hydrogen as the carrying gas , we applied r . f . glow discharge plasma to preparation the working film for the qcm sensors 在“實驗與分析”一章中較為詳細地闡述了采用等離子體化學氣相淀積的方法，以正丁胺作為碳源物質，通過射頻輝光放電在低溫低壓條件下制得了正丁胺等離子體淀積膜。

Plasma nitriding is an application way to metal surface and heating treatment based on the formed plasma by glow discharge . nitriding is a way of heating treatment , namely , metal accessory is put into activate nitrogen and the gas of low light pressure is ionized into energy electrons , high energy ions and high energy neutral atoms by the action of the electric field under a definite temperature and the time of the heat preservation 等離子滲氮是利用輝光放電形成等離子體在金屬表面，熱處理方面的應用，滲氮是強化金屬表面的一種熱處理方法，是將金屬零件置于活性氮的介質中，在一定溫度和保溫時間下，低光壓氣體在電場作用下使之電離產生能電子、高能離子和高能中性原子。

By means of resistance and capacitance coupled negative feedback method to control the plasma discharge development process and prevent the transition from glow discharge to spark discharge in a pin - to - plate static air plasma generator , a stable alternative current atmospheric glow discharge is produced successfully 在靜態大氣壓空氣針板等離子體發生器中，采用阻容耦合負反饋方法控制等離子體放電發展過程，成功地抑制了輝光放電向火花放電的過渡，產生了穩定的交流輝光放電。

( iii ) dust charging and levitation in cathode sheath of glow discharges with energetic electron beam . the dust charging and levitation in a collisionless cathode sheath of dc glow discharges with energetic electron beams released from a plane cathode are investigated with a self - consistent theoretic model ( )塵埃粒子在極板有高能電子束發射輝光放電鞘層中的充電與懸浮采用自洽的鞘層模型和塵埃粒子充電模型，我們研究了在極板有高能電子束發射輝光放電鞘層中塵埃粒子的充電與懸浮。

The main purpose of this article - is to simulate the whole process of the generation and transportation of the vapor phase particles of the film in rf magnetron sputtering , which contains transportation of ions in rf glow discharge , sputtering of target and transportation of sputtered atoms , via models that are established on the basis of the physics of sheath theory for the rf magnetron glow discharge , sputtering theory and transportation theory 本論文對射頻磁控濺射中入射離子的產生和輸運、離子對靶材的濺射、濺射原子的輸運過程進行了綜合考慮，根據射頻輝光放電的陰極殼層理論、粒子的輸運理論、離子對靶材的濺射理論建立模型，進行了計算機模擬。

Applying r . f . glow discharging plasma to process the surface of the trlethanolamine coating on the qcm sensor , the qcm sensor ? performances are well ameliorated . analysis and testing indicates that the processed sensor responses to various organic compounds vapor steadily , sensitively and quickly 實驗表明：處理后的三乙醇胺涂膜qcm傳感器依然表現出對乙醛的良好的化學選擇性與靈敏度，同時最為重要的是，器件的性能大有改良：響應穩定可靠，易于再生，且使用壽命較長。

The dlc and a - sic : h films have been prepared by rf glow discharge . the irradiated samples were characterized by ramaiynfrared and uv - vis - nir spectroscopy mainly . according to the physical mechanisms related to the interaction of photons , neutrons , and ions with matter , the results and phenomena are explained and discussed . the structures and properties of the films depend strongly upon the hydrogen content and the binding state 對輻照前后的樣品采用喇曼( raman )光譜、紅外( m )光譜及紫外?可見?近紅外( uv ? vis ? nir )光譜等儀器進行分析，根據光子、中子、離子與物質作用的物理機制，對所得結果及其現象進行了解釋。

The organic electroluminsecence devices : ito / tpd / alq3 / al were fabracated by reactive evaporating deposition and dc glow discharge plasma enhanced reactive evaporating ways . the effects of the organic film thickness on the electronic and optical property have been investigated 使用真空蒸發沉積技術和直流輝光等離子體輔助反應蒸發沉積技術制備了四層結構的有機電致發光器件： ito / tpd / alq _ 3 / al ，對制得的器件進行了電學和光學性能的測試。

Glow discharge appears when applied voltage further increases . with air gap increases , the mean discharge magnitude reduces . there is not an obvious effect of water conductivity on the mean discharge magnitude at dry ice , however , the mean discharge magnitude increases when water conductivity increases 干冰時覆冰水電導率對平均放電量的影響不大;濕冰情況下,覆冰水電導率越大平均放電量越大,其平均放電量明顯高于干冰。

The main results of this article are : ( 1 ) the software that is to simulate the transportation of ions in rf glow discharge , in which a simple method to determine the original states of the ions ( original velocities and positions ) is recommended 本論文的主要結果有： ( 1 )編寫了射頻輝光放電過程中入射離子的輸運模擬程序，并提出了一種簡單的決定離子初始狀態(位置、速度)的方法。

1 、 the activated process of the metal halide lights is analyzed . the processes mainly include four - discharged stage : breakdown ? glow discharge sputtering ? the glow transition to the arc - - arc discharge sputtering 1 .分析了金屬鹵化物燈的啟動過程,金屬鹵化物燈的啟動過程主要包括:擊穿? ?輝光放電? ?輝光向弧光的過渡? ?弧光放電四個放電階段。

The normal glow discharge between the main electrodes and the rapid flow of the unpolluted gas mixtures are necessary conditions for the output of high average power for tea co2 laser 主電極間正常的輝光放電以及使混合氣快速流動且不被污染是重復頻率teaco _ 2激光器實現高平均功率輸出的重要條件。

The results show that as the voltage rises , the tubes ’ discharge mechanism changes from glow discharge to arc discharge , the current rises suddenly and the voltage drops a lot 結果表明,隨著電壓的升高,六硼化鑭放電管的放電機理由輝光放電轉變為弧光放電,放電電流突然迅速升高,管壓降大幅下降。

Standard test method for trace metallic impurities in electronic grade aluminum - copper , aluminum - silicon , and aluminum - copper - silicon alloys by high - mass - reduction glow discharge mass spectrometer 用高質量減少輝光放電質譜儀測量電子級鋁銅鋁硅和鋁銅硅中微量金屬雜質的標準試驗方法

The degradation of nitrobenzene , p - chloronitrobenzene and chloroanilines in aqueous solution were investigated by means of contact glow discharge electrolysis 利用接觸輝光放電等離子體對水體中有機污染物氯代苯胺、硝基苯、對氯硝基苯等進行了降解。